Lithography-Symposium in Vienna

13. March 2019

Institute of Science and Technology (IST) Austria

Klosterneuburg near Vienna, Austria

This symposium features technical experts and customers from Heidelberg Instruments, Nanoscribe, micro resist technology and Raith who will describe the spectrum of latest, state-of-the-art direct-write capabilities. The Institute of Science and Technology makes modern nanofabrication capabilities available to the community; they also welcome researchers from industry and other universities.

An opportunity to get a broad overview of different aspects of direct write lithographyand to meet experts in all sorts of micro- and nanolithography disciplines!

Registration fee: participation is free for registered, academic participants. Industrial suppliers will be charged (participation fee €250)

Deadline for registration: February 28th, 2019

files/heidelberg/layout/arrow.pngFind the agenda and register here (you will be forwarded to the Raith website)