Heidelberg Instruments completes multiple installations of MLA150 Maskless Aligner systems at National institute of Standards and Technology (NIST)
Heidelberg, Germany/Boston, MA, USA: Heidelberg Instruments is proud to have completed the installation of two of their Maskless Aligner systems at the NIST Center of Nanoscale Science and Technology in Maryland and the NIST Microfabrication Facility in Boulder, Colorado.
The MLA150 Maskless Aligner with automated alignment, direct mode and its high throughput is a new direct write alternative to the traditional mask based lithography process.
Since its introduction the MLA150 has been adopted by research and industry at an incredible rate and have made them a staple of research labs and production facilities world-wide.
Niels Wijnaendts van Resandt, Heidelberg Instruments Director of Sales for North America, states:
“Since its introduction in 2015, the MLA150 has become a standard for direct write laser lithography in the field of research and development. We are proud that our tools have been selected by many prestigious laboratories in the US, including NIST, for their increasingly demanding applications and continue to further improvements of the tool.”
About the NIST CNST NanoFab: The NanoFab provides researchers with rapid access to state-of-the-art, commercial nanoscale measurement and fabrication tools and methods, along with associated technical expertise, at economical hourly rates. It is well equipped to process and characterize a wide range of nanoscale materials, structures, and devices.
About the NIST Boulder MicroFabrication Facility (BMF): The BMF is an 18,000 square feet class 100 clean room located in the new Katharine Blodgett Gebbie Laboratory. The Facility provides state-of-the-art microelectronic and microelectromechanical systems (MEMS) fabrication capability for the NIST Boulder site.
About Heidelberg Instruments, GmbH: With an installation base of over 800 systems in more than 50 countries, Heidelberg Instruments Mikrotechnik GmbH is a world leader in the production of high-precision laser and maskless lithography systems. Due to their flexibility, power and versatility, these systems are employed for direct writing and photomask production in a wide range of settings and applications in research, development, and industry. Customers include some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, nanotechnology, ASICS, TFT, displays, micro optics, and many other related applications.