Volume Pattern Generators
The VPG 400 and VPG 200 family of systems introduce Heidelberg Instruments’ most advanced small and midsize high speed exposure systems currently available on the market. These systems represent over 2 decades of application and process experience in small area lithography combined with advanced and field proven technology used on our industry standard large area VPG (Volume Pattern Generator) platforms. Combining high resolution, outstanding image quality and fast throughput, the VPG 400 and VPG 200 are ideal systems for rapid photomask fabrication.
Because of the high exposure speed, the VPG 400 and VPG 200 can not only be used for mask production but also for direct exposure on wafers or any other flat substrates coated with photosensitive material. As an example, a 4” wafer can be patterned in less than 2 minutes, eliminating the need for photomasks and mask aligner tools. Systems can be used in a variety of demanding fields that require microstructures. Typical applications include MEMS, Advanced Packaging, LED production, Life Science, Compound Semiconductor and other applications.