Key Features and Options

  • Substrates up to size of 1600 x 1400 mm2
  • Structures down to 1.0 µm
  • Address grid down to 50 nm
  • Multiple write modes
  • Automatic write mode exchanger
  • Metrology and alignment system
  • Climate chamber
  • Online data transfer
  • Automatic loading system
  • Multiple data input formats (DXF, CIF, GDSII, Gerber, STL)
  • Stage map correction
  • Edge detector unit
  • Mura correction

Download Fact Sheet VPG Series
[pdf / 1.3 MB]

VPG 1600 - The Ultimate High Volume Photomask Production Tool

VPG 1600

A milestone in technological innovation and product development

Pattern

The new Volume Pattern Generator (VPG) line of large area lithography systems is a milestone in technological innovation and product development from Heidelberg Instruments, based on a patented vast exposure process parallelization. VPG is a reliable and economical solution, ideal for high volume production of today's demanding photomasks in electronic packaging, color filters and other applications requiring high resolution features on large areas with excellent image quality and registration.

The VPG can be configured with various stage dimensions and can be configured with an automated write mode exchanging unit (Automatic Write Mode), providing always the best throughput and resolution for various applications.

The VPG can be configured with various stage dimensions designed to accommodate substrate sizes of up to 1600 mm by 1400 mm, 1100 mm by 1100 mm, 800 mm by 800 mm and 400 mm by 400 mm. These systems can be equipped with air-bearing stage, semi or fully automatic feeder for substrate loading and a UV laser source with an output of up to 20 W. A small write grid ensures excellent edge roughness and stripe butting. The automatic calibration of stage positioning is achieved with great efficiency using the 2D Stage Map Correction.

For additional information please Download the Fact Sheet or Contact us anytime.