Fact Sheet µPG 501
[pdf / 1.2 MB]
Designed with the focus on high performance at an affordable price, the µPG 501 is the perfect solution for prototyping such as MEMS, Integrated Optics, Micro Fluids, Lab-on-a-Chip devices and Photomask fabrication. The µPG 501 offers two optional configurations. With Write Mode-1 it is possible to write structures down to 1 µm at a speed of 50 mm2/minute. In Write Mode-2 you can produce features down to 2 µm with a speed of 100 mm2/min. The integrated exposure wizard (GUI) guides the operator through the complete procedure: Load the substrate, select the design and start the exposure. The µPG 501 was designed to fit even into the smallest R&D laboratories, and requires only power connection and an air pressure supply to operate.
The µPG 501 is equipped with a high power LED light source, providing exceptional reliability and very long lifetime. The standard wavelength is 390nm. Other wavelengths may be available up on request. The µPG 501 can expose standard positive and negative photo resists as well as UV-resists such as SU8. Since the intensity dose is not limited, the system is suitable for applications, which require thick resists. Utilizing our Gray Scale Exposure technology, the µPG 501 has the ability to create 3 dimensional structures such as blazed gratings or micro-lenses.
The integrated metrology system allows to do overlay exposures either by manual or automatic alignment to multiple targets on the substrate. Our field proven Autofocus System compensates flatness variation of the substrate in real-time. This is an essential feature especially for high-resolution lithography systems. Custom made vacuum chucks can hold substrates with various sizes up to 6“. The stage is driven by powerful linear motors and controlled by encoders at a resolution of 20 nm.