Fact Sheet µPG 101
[pdf / 1.2 MB]
The µPG 101 s an extremely economical and easy to use micro pattern generator for direct writing applications and low volume mask making. The system can be used for applications such as MEMS, Bio MEMS, Integrated Optics, Micro Fluidics or any other application that requires high precision, high-resolution microstructures.The μPG 101 offers a small footprint of only 60x75 cm², featuring a compact design with all electronic components integrated into the system. A personal computer is used as system control. The GUI based control software makes it easy for users to convert the designs, perform a manual or automatic alignment and start the exposure.
The µPG 101 is designed to provide an easy and fast way to create the microstructures needed for your business or research. The tabletop system features exchangeable write modes to meet the resolution and write speed requirements of your specific application. It is the only available desktop lithography system in the market, which can produce sub-micron features. The small address grid allows placement of structures with very high accuracy. The real-time autofocus system monitors and corrects focus position during exposure, which guarantees high resolution and repeatability over the entire exposure area. Small address grid and real-time autofocus system are essential features for a professional micro pattern solution.
The standard system is equipped with a diode laser at 405 nm, which presents a reliable laser source with a long lifetime. This laser can be used to expose the standard photoresists that are used in lithography. Alternatively, the system can be equipped with a laser diode at 375 nm, making it possible to expose standard resists and UV resists such as SU-8. The system offers a raster-scan and vector exposure mode for high resolution 2D patterns and in addition it is also possible to create complex 3D structures in thick photoresist in a single pass.