Fact Sheet DWL 66 FS
[pdf / 1.3 MB]
The DWL 66FS laser lithography system is an economical, high resolution pattern generator for low volume mask making and direct writing.
The capabilities and flexibility of this system make it the ultimate lithographic research tool in MEMS, BioMEMS, Micro Optics, ASICs, Micro Fluidics, Sensors, CGHs, and all other applications that require microstructures.
The customer base of the DWL 66FS includes over 100 leading universities and research facilities world wide. Many of the system features have been developed in close cooperation with these institutions.
The system can utilize a variety of different lasers, which makes it possible to expose nearly all photoresists, including UV resists like SU8. In addition to high resolution 2D patterns, it is also possible to create complex 3D structures in thick photoresist with a single pass. By supporting five different write modes the resolution and throughput of the system can be optimized for each application. The optional vector exposure mode will offer even further flexibility such as improved structure quality and a higher throughput for certain designs like waveguides or microfluidic channels.