Key Features and Options

  • Substrates up to 400 x 400 mm2
  • Structures down to 0.6 µm
  • Address grid down to 10 nm
  • Multiple write modes
  • Automatic write mode exchanger
  • Advanced 3D exposure mode
  • Metrology and alignment system
  • Climate chamber
  • Customer specific laser source
  • Online data transfer
  • Automatic loading system
  • Multiple data input formats (DXF, CIF, GDSII, Gerber, STL)
  • Stage map correction

Download Fact Sheet DWL 4000
[pdf / 1.3 MB]

DWL 4000 - The Advanced Laser Pattern Generator for High Resolution Photomasks

DWL 4000

Pattern

Pattern

Pattern

An ideal solution for effective and high resolution mask and wafer patterning

The DWL 4000 line of laser lithography systems is an ideal solution to cost effective, high resolution, mask and wafer patterning up to 400 mm x 400 mm. The DWL 4000 systems are utilized in a variety of applications that require complex micro-structures, such as: MEMS, SAW Devices, ASICS, MCMs, Integrated Optics and Displays.

The DWL 4000 line consists of two models, the DWL 4000DD and the higher throughput DWL 4000FBM. Besides 2D patterns used in common applications requiring binary exposure, the new DWL 4000 systems can also create complex 3D structures, such as micro-optics, using a cutting edge gray scale exposure technology.

For additional information please Download the Fact Sheet or Contact us anytime.