Fact Sheet DWL 2000/4000
[pdf / 1.4 MB]
The DWL 2000 and DWL 4000 laser lithography systems are fast, flexible high-resolution pattern generators for mask making and direct writing. With a write area of up to 400 x 400 mm2 these systems are the perfect solution for fast patterning of masks and wafers in MEMS, BioMEMS, Micro Optics, ASICs, Micro Fluidics, Sensors, CGHs, and all other applications that require microstructures.
In addition to high-resolution 2D patterns systems provide a special exposure mode, known as Gray Scale lithography, to create complex 3D structures in thick photoresist. In contrary to other technologies this method enables high throughput formation of 3D microstructures over large areas. Special software tools for optimization and evaluation of Gray Scale exposures have been developed to reduce the cycle time for new products. To ensure lowest surface roughness and shape conformity the systems support up to 4096 gray levels, an unmatched capability in the current market. Most common applications include fabrication of wafer level optics used for telecommunication or illumination market segments where our systems are being used by some of the largest multinational corporations. Other new applications include display manufacturing as well as device fabrication in the areas of biology and life sciences.
The DWL 2000 and DWL 4000 are able to utilize different lasers, making it possible to expose nearly all photoresists including negative tone resists like SU-8. A fixed optical setup, a reliable real-time auto focus system and a high precision air-bearing stage system guarantee the quality and position accuracy of the exposed structures. A high-resolution interferometer monitors the position of the stage at all times. To ensure maximum stability, an advanced climate control provides constant temperature stability during operation. Additional software is used to compensate for any remaining variation in the mechanical structures or the environmental parameters.