Fact Sheet DWL 2000
[pdf / 1.4 MB]
The DWL 2000 laser lithography system is a fast and flexible, high resolution pattern generator for mask making and direct writing. In addition to 2D patterns, the state of the art technology of the system can also create complex 3D structures in thick photoresist with a single pass.
With a write area of up to 200 x 200 mm2 the system is the perfect solution for fast patterning of masks and wafers in MEMS, BioMEMS, Micro Optics, ASICs, Micro Fluidics, Sensors, CGHs, and all other applications that require microstructures.