Heidelberg Instruments Mikrotechnik GmbH

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Product Line

We have developed maskless lithography systems for a wide range of applications. To find the right system for your requirements, you can refer to the catagories below, use the System Selector, or just Contact us directly.

Systems ideal for research and development environment
	µPG 101 The Tabletop Laser Pattern Generator
	DWL 66FS The Ultimate R&D Laser Lithography Tool

Fast and flexible systems for small to medium area exposures
	DWL 2000 The Fast and Flexible Laser Lithography System
	DWL 4000 The Advanced Laser Pattern Generator for High Resolution Photomasks

Advanced large area exposure systems
	DWL 8000 Advanced Large Area 2D and 3D Exposure System
	VPG 1600 The Ultimate High Volume Photomask Production Tool

Special systems designed for custom requirements
	Special Systems Special Systems- Lithography Systems designed for Custom Applications

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