Heidelberg Instruments Mikrotechnik GmbH

Heidelberg, Germany, September 21, 2010:  Heidelberg Instruments announced the sale of an advanced Lithography System to the research unit of a large telecommunication service provider.
The DWL maskless lithography system will be equipped with binary and gray scale exposure capabilities, layer to layer alignment.  System will be used for fabricating of […]

Heidelberg, Germany, September 20, 2010:  Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to National University of Singapore, Mechanobiology Institute.  System will be used in fabrication of devices critical to quantitative systems approaches to understand biomechanical functions.
The DWL 66FS maskless lithography system […]

Heidelberg, Germany, June 07, 2010:  Heidelberg Instruments announced the sale of an advanced Lithography System to a European research unit of a large Asian based corporation.
The DWL maskless lithography system will be equipped with binary and gray scale exposure capabilities, layer to layer alignment, and sub micron exposure mode.
About Heidelberg Instruments […]

Heidelberg, Germany, June 01, 2010:  Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced order for an advanced VPG maskless lithography system from a leading Asian based photomask production group.
“VPG platform continues to be on high demand for large photomask production.  We are very […]

Heidelberg, Germany, May 27, 2010:  Heidelberg Instruments announced the sale of multiple µPG101 Table Top Lithography Systems to the Air Force Institute of Technology, USA.
The µPG101 is an extremely economical and easy to use Micro Pattern Generator for direct write applications as well as low volume mask making. It is also […]