Heidelberg Instruments Mikrotechnik GmbH

Heidelberg, Germany, April 5th, 2011:  Heidelberg Instruments announces the installation of a µPG101 at STMicroelectronics in Agrate, Italy.
The µPG101 is an extremely economical and easy to use Micro Pattern Generator for direct write applications as well as low volume mask making. It is also perfectly suitable for rapid prototyping […]

Heidelberg, Germany, March 11, 2011: Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to Karlsruhe Institute of Technology, Germany.
The DWL 66FS maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce sub micron features.
“The […]

Heidelberg, Germany, March 10, 2011:  Heidelberg Instruments announced the sale of an advanced Lithography System to the Nano Structures Laboratory at the Massachusetts Institute of Technology, USA.
The maskless lithography system will be equipped with binary and gray scale exposure capabilities, layer to layer alignment, raster and vector scanning technology.  […]

Heidelberg, Germany, January 10, 2011: Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced orders for multiple advanced VPG maskless lithography systems from leading Asian based photomask production groups.
“VPG platform has solidified its position in large area photomask production. 2010 was a fantastic year as high technology companies […]

Heidelberg, Germany, September 22, 2010:  Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced the order of an advanced DWL 4000 maskless lithography system by the China Electronic Technology Group Corporation located in Nanjing.
System will be used for fabrication of various MEMS devices.
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