Stay
up to date with the latest business news from our site. National Institute of Standards and Technology Selects Heidelberg Instruments’ Maskless Lithography System
Heidelberg, Germany, December 18, 2007: Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the United States based National Institute of Standards and Technology (NIST).
The DWL system will be installed in the clean room at the Center for Nanoscale Science and Technology, which is part of NIST (www.cnst.nist.gov). It will be used to support both mask writing as well as direct-write lithography for patterning sub-micron features on a variety of substrate materials.
The DWL 66FS maskless lithography system is capable of binary and grey scale exposure, layer to layer alignment, and able to produce minimum features down to 0.6 microns.
About Heidelberg Instruments GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.
Heidelberg Instruments GmbH
Contact: Britta Abler
Web: www.himt.de