Heidelberg, Germany, December 21, 2007: Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced an order for a DWL 1100 Maskless Lithography System from Mikcell Oy, Finland.
DWL 1100 maskless lithography system is capable of exposing photomasks of up to 1.1m x 1.1m, with features down to 1 micron. Among other things, it’s equipped with a semi automatic handling system, online data transfer, metrology and alignment system.
“Thanks to our investment in DWL 1100 Laser Lithography System from Heidelberger Instruments, we will be able to start large-scale production and increase our market share. This will significantly strengthen our position in the international markets” says Elina Ruohonen-Löw, Managing Director. “The system will be used in different kind of applications such as MEMS, advanced electronic packaging in the semiconductor and telecommunication industry, LCD and IC circuit production process”.
About Mikcell Oy: Mikcell Oy is an ISO 9001:2000 certified photomask company operating in the Oulu region in Finland. Mikcell works in cooperation with multinational semiconductor groups, providing them with its know-how in photolithographic applications.
About Heidelberg Instruments, GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of Advanced Electronic Packaging, MEMS, BioMEMS, Nano Technology, ASICS, Display, Micro Optics, and many other related applications.