Heidelberg Instruments to support nano research at the National Nano Fab Center, Korea
Heidelberg, Germany, August 9, 2007: Heidelberg Instruments announced the sale of an advanced DWL 200 maskless laser lithography system to the National Nano Fab Center located at the Korea Advanced Institute of Science and Technology, Daejeon, Korea. Role of this facility is to assist national competitiveness in nano technology and to contribute to development of the relevant industries by constructing research & development support system in the filed of nano device & compound semiconductor-oriented non-silicon.
The DWL 200 system will enable the user to expose sub micron structures on photoresist, with an active write area of up to 200 mm by 200 mm.
About Heidelberg Instruments GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.
Heidelberg Instruments, GmbH
Britta Abler
Email: britta.abler@himt.de
Web: www.himt.de