Heidelberg Instruments Mikrotechnik GmbH

Heidelberg, Germany, October 29, 2008: Heidelberg Instruments announced the purchase of a DWL 66FS maskless lithography system by the National Aeronautics and Space Administration (NASA), USA. The DWL 66FS lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce sub micron features. NASA will use the DWL 66FS for micro optics and sensor research.

About Heidelberg Instruments GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.

Heidelberg Instruments, GmbH
Contact: Britta Abler
Web: www.himt.de