Heidelberg, Germany, November 02, 2007: Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the Technology Research Institute of Osaka.
The Institute is a public research organization founded to conduct technical guidance and research collaborations with industries in Osaka, especially small-to-medium-sized enterprises.
DWL 66FS will be used for various research in Micro and Nano areas.
About Heidelberg Instruments, GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of Advanced Electronic Packaging, MEMS, BioMEMS, Nano Technology, ASICS, Display, Micro Optics, and many other related applications.