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up to date with the latest business news from our site. Heidelberg Instruments delivers the next generation maskless lithography system
Heidelberg, Germany, May 24, 2010: Heidelberg Instruments announced the delivery of an advanced maskless lithography system customized for micro pattering of free form and non planer substrates such as concave and convex lenses.
The new lithography system will contribute to the Hemispherical Array Detectors for Imaging (HARDI) program, by the Defense Advanced Research Projects Agency (DARPA), and will be used for fabrication of the small hemispherical optical imaging sensor array with a 120-degree field of view. This system is capable of exposing features down to 1µm, with an address grid of 50 nm, on the entire inner surface of a hemispherical substrate, in addition to other free form surfaces.
About Heidelberg Instruments GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.
Heidelberg Instruments, GmbH
Contact: info@himt.de