Heidelberg Instruments announced the sale of an advanced DWL66 fs maskless laser lithography system to the Boston University Photonics Center
Heidelberg, Germany, Sept 13, 2006: Heidelberg Instruments announced the sale of an advanced DWL66 fs maskless laser lithography system to the Boston University Photonics Center.
The DWL66 fs maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce minimum features down to 0.6 microns.