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Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Nano Fabrication Center at the National Chiao Tung University, Taiwan

Heidelberg, Germany, November 21, 2006: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Nano Fabrication Center at the National Chiao Tung University, Taiwan.

The DWL200 system will enable the user to expose sub micron structures on photoresist , with an active write area of up to 200 mm by 200 mm.

About Heidelberg Instruments, GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.

Heidelberg Instruments, GmbH
Alexander Forozan
VP, Sales and Marketing
Email: alexander.forozan@himt.de
Web: www.himt.de