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	<title>Heidelberg Instruments Microtechnik GmbH</title>
	<link>http://www.himt.de/en/news</link>
	<description></description>
	<pubDate>Wed, 16 May 2012 08:38:20 +0000</pubDate>
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		<title>Heidelberg Instruments GmbH receives multiple orders for advanced VPG maskless lithography systems from Asia</title>
		<link>http://www.himt.de/en/news/index.php/news/heidelberg-instruments-gmbh-receives-multiple-orders-for-advanced-vpg-maskless-lithography-systems-from-asia-3</link>
		<comments>http://www.himt.de/en/news/index.php/news/heidelberg-instruments-gmbh-receives-multiple-orders-for-advanced-vpg-maskless-lithography-systems-from-asia-3#comments</comments>
		<pubDate>Wed, 25 Apr 2012 07:43:38 +0000</pubDate>
		<dc:creator>himt</dc:creator>
		
		<category><![CDATA[News]]></category>

		<guid isPermaLink="false">http://www.himt.de/en/news/index.php/news/heidelberg-instruments-gmbh-receives-multiple-orders-for-advanced-vpg-maskless-lithography-systems-from-asia-3</guid>
		<description><![CDATA[Heidelberg, Germany, April 25, 2012:  Heidelberg Instruments  GmbH, Heidelberg, Germany, a leading supplier of direct write laser  lithography systems, announced order for two advanced VPG maskless  lithography systems from an Asian based photomask production group.  First system, a VPG 1400, is the latest and most advanced large area  production system [...]]]></description>
			<content:encoded><![CDATA[<p><strong>Heidelberg, Germany, April 25, 2012: </strong> Heidelberg Instruments  GmbH, Heidelberg, Germany, a leading supplier of direct write laser  lithography systems, announced order for two advanced VPG maskless  lithography systems from an Asian based photomask production group.  First system, a VPG 1400, is the latest and most advanced large area  production system by Heidelberg Instruments. VPG 1400 has a write area  of 1.4 by 1.4 meters, and is configured to expose sub-micron structures  at a high throughput with an address grid of 10 nm.The second system, a VPG 800, is capable of exposing an area of up to 800 mm by 800 mm.</p>
<p>“The VPG 1400 is another milestone in innovation by Heidelberg  Instruments which with its wide range of capabilities will enable the  end user to work on a number of applications.  This order further  solidifies the VPG technology as a leading solution for advanced  photomask production groups.” states Alexander Forozan, Head of Global  Sales and Business Development</p>
<p><strong>About Heidelberg Instruments GmbH:</strong> With an installation base  in over 40 countries, Heidelberg Instruments is a world leader in  production of high precision maskless lithography systems.  These  systems are used for direct writing and photomask production by some of  the most prestigious universities and industry leaders in the areas of  MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro  Optics, and many other related applications.</p>
<p class="MsoNormal"><span style="font-size: 11pt" lang="EN-US"></span><strong><span style="font-size: 11pt" lang="EN-US">Heidelberg Instruments GmbH</span></strong></p>
<p>Contact: <a href="http://www.himt.de/en/contact/contact-form.php">info@himt.de</a></p>
<p class="MsoNormal"><span style="font-size: 11pt" lang="EN-US"> </span></p>
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		<title>Heidelberg Instruments announces the installation of a DWL 2000 at Carl Zeiss Jena GmbH, Germany</title>
		<link>http://www.himt.de/en/news/index.php/news/heidelberg-instruments-announces-the-installation-of-a-dwl-2000-at-carl-zeiss-jena-gmbh-germany</link>
		<comments>http://www.himt.de/en/news/index.php/news/heidelberg-instruments-announces-the-installation-of-a-dwl-2000-at-carl-zeiss-jena-gmbh-germany#comments</comments>
		<pubDate>Wed, 22 Feb 2012 08:52:15 +0000</pubDate>
		<dc:creator>himt</dc:creator>
		
		<category><![CDATA[News]]></category>

		<guid isPermaLink="false">http://www.himt.de/en/news/index.php/news/heidelberg-instruments-announces-the-installation-of-a-dwl-2000-at-carl-zeiss-jena-gmbh-germany</guid>
		<description><![CDATA[Heidelberg, Germany, February 22th, 2012:  Heidelberg Instruments announces the installation of a DWL 2000 at Carl Zeiss Jena GmbH, Germany.
The DWL 2000 is a fast and flexible, high resolution pattern generator for mask making and direct writing of 2D and 3D micro structures. The system will be used for the production of state of the [...]]]></description>
			<content:encoded><![CDATA[<p class="MsoNormal"><span lang="EN-US"><strong>Heidelberg, Germany, February 22th, 2012:</strong><span>  </span>Heidelberg Instruments announces the installation of a DWL 2000 at Carl Zeiss Jena GmbH, Germany.</span></p>
<p class="MsoNormal"><span lang="EN-US">The DWL 2000 is a fast and flexible, high resolution pattern generator for mask making and direct writing of 2D and 3D micro structures. The system will be used for the production of state of the art micro optical components. With its advanced gray scale capabilities it can write arbitrary surface profiles and create highly complex optical elements with low surface roughness.</span></p>
<p class="MsoNormal"><span lang="EN-US">Carl Zeiss Jena GmbH is widely established company with facilities in Jena, Oberkochen and Minsk in Belarus - a flexible center of excellence for single components and for complex assemblies and modules. The internationally aligned sourcing and partner network provides support over the entire value-add process. With its innovational capability, Carl Zeiss Jena GmbH is synonymous with transforming technological challenges into benefit-oriented solutions. Committed employees, ultra-modern technologies and a highly productive engineering capability are at disposal.</span></p>
<p class="MsoNormal"><span lang="EN-US"><strong>About Heidelberg Instruments GmbH:</strong><span>  </span>With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro optics, and many other related applications.</span></p>
<p class="MsoNormal">&nbsp;</p>
<p><strong>Heidelberg Instruments, GmbH</strong></p>
<p>Contact: <a href="http://www.himt.de/en/contact/contact-form.php">info@himt.de</a><span lang="EN-US"><o:p></o:p></span></p>
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		<title>Heidelberg Instruments introduces an advanced table top direct write lithography system</title>
		<link>http://www.himt.de/en/news/index.php/news/heidelberg-instruments-introduces-an-advanced-table-top-direct-write-lithography-system</link>
		<comments>http://www.himt.de/en/news/index.php/news/heidelberg-instruments-introduces-an-advanced-table-top-direct-write-lithography-system#comments</comments>
		<pubDate>Wed, 25 Jan 2012 14:00:41 +0000</pubDate>
		<dc:creator>himt</dc:creator>
		
		<category><![CDATA[News]]></category>

		<guid isPermaLink="false">http://www.himt.de/en/news/index.php/news/heidelberg-instruments-introduces-an-advanced-table-top-direct-write-lithography-system</guid>
		<description><![CDATA[Heidelberg, Germany, January 25, 2012:  Heidelberg Instruments extends its leadership in manufacturing of direct write lithography systems with the launch of µPG 501 table top system.  Designed with the focus on high performance at an affordable price, the μPG 501 is the perfect solution for prototyping various devices such as MEMS, integrated Optics, microfluids, Lab-on-a-Chip, [...]]]></description>
			<content:encoded><![CDATA[<p><strong>Heidelberg, Germany, January 25, 2012:</strong>  Heidelberg Instruments extends its leadership in manufacturing of direct write lithography systems with the launch of µPG 501 table top system.  Designed with the focus on high performance at an affordable price, the μPG 501 is the perfect solution for prototyping various devices such as MEMS, integrated Optics, microfluids, Lab-on-a-Chip, as well as mask production. The system has the ability to write structures down to 1 μm at a speed of 50 mm²/min. This equals an exposure time of less than one hour for a 2“x 2“ pattern. With a footprint of only 60 x 75 cm² the μPG 501 comes with a wide range of capabilities.</p>
<p>System is equipped with the data conversion software which is simple to operate and provides basic design operations, and features a viewer for the design data as well as for the converted pixel data. The software supports multiple data formats such as GDSII, DXF, GERBER, CIF, BMP, and STL.  μPG 501 is equipped with a high power LED light source, providing exceptional reliability and very long lifetime. The standard available wavelengths are 390 or 405 nm. Other wavelengths may be available up on request. The μPG 501 can expose standard positive and negative photo resists as well as UV-resists such as SU8. Since the intensity dose is not limited, the system is suitable for applications which require thick resists. Utilizing sophisticated Gray Scale Exposure technology, the μPG 501 has the ability to create 3 dimensional structures such as blazed gratings or micro-lenses.</p>
<p>The light engine features the Digital Micromirror Device (DMD™) as the imaging device, a platform which is already available in the market and has been constantly improved for usage in commercial as well as R&amp;D applications. Besides enabling high throughput, a major advantage of the DMD™ is, it‘s reliability in the visible as well as in the UV spectrum of the illumination.</p>
<p>The integrated metrology system enables the μPG 501 to do overlay exposures either by manual or automatic alignment to multiple targets on the substrate. Company’s field proven Autofocus System compensates flatness variation of the substrate in real-time. This is an essential feature especially for high-resolution lithography systems. Custom made vacuum chucks can hold substrates with various sizes up to 5”. The stage is driven by powerful linear motors and controlled by encoders at a resolution of 20 nm.</p>
<p>“The μPG 501 exemplifies Heidelberg Instruments continuing innovation aimed at extending advanced lithography technologies” said Alexander Forozan, head of Global Sales and Business Development at Heidelberg Instruments. “This system will present researchers with a fantastic tool at an affordable price, enabling them to conduct low volume lithography without using photomasks and mask aligners.”</p>
<p><strong>About Heidelberg Instruments, GmbH:</strong>  With an installation base in over 40 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems.  These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.</p>
<p><strong>Heidelberg Instruments, GmbH</strong></p>
<p>Contact: <a href="http://www.himt.de/en/contact/contact-form.php">info@himt.de</a></p>
<p>Also see :<a href="http://www.himt.de/en/products/muepg501.php"> µPG 501</a></p>
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		<title>Heidelberg Instruments to support micro and nano research at the University of Minnesota Nanofabrication Center (NFC)</title>
		<link>http://www.himt.de/en/news/index.php/news/heidelberg-instruments-to-support-micro-and-nano-research-at-the-university-of-minnesota-nanofabrication-center-nfc</link>
		<comments>http://www.himt.de/en/news/index.php/news/heidelberg-instruments-to-support-micro-and-nano-research-at-the-university-of-minnesota-nanofabrication-center-nfc#comments</comments>
		<pubDate>Fri, 20 Jan 2012 04:00:44 +0000</pubDate>
		<dc:creator>himt</dc:creator>
		
		<category><![CDATA[News]]></category>

		<guid isPermaLink="false">http://www.himt.de/en/news/index.php/news/heidelberg-instruments-to-support-micro-and-nano-research-at-the-university-of-minnesota-nanofabrication-center-nfc</guid>
		<description><![CDATA[Heidelberg, Germany, January 20, 2012:  Heidelberg Instruments  announced the sale of a DWL 200 maskless laser lithography system to  the University of Minnesota Nanofabrication Center in Minneapolis, USA.
The DWL 200 maskless lithography system is capable of binary and gray  scale exposure, layer to layer alignment, and is able to produce sub  [...]]]></description>
			<content:encoded><![CDATA[<p><strong>Heidelberg, Germany, January 20, 2012:</strong>  Heidelberg Instruments  announced the sale of a DWL 200 maskless laser lithography system to  the University of Minnesota Nanofabrication Center in Minneapolis, USA.</p>
<p>The DWL 200 maskless lithography system is capable of binary and gray  scale exposure, layer to layer alignment, and is able to produce sub  micron features.</p>
<p><strong>About Heidelberg Instruments, GmbH:</strong>  With an installation base  in over 40 countries, Heidelberg Instruments is a world leader in  production of high precision maskless lithography systems.  These  systems are used for direct writing and photomask production by some of  the most prestigious universities and industry leaders in the areas of  MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro  Optics, and many other related applications.</p>
<p><strong>Heidelberg Instruments, GmbH</strong></p>
<p>Contact: <a href="http://www.himt.de/en/contact/contact-form.php">info@himt.de</a></p>
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		<title>Heidelberg Instruments to support Nano and Biotechnology Research Division at the Daegu Gyeongbuk Institute of Science and Technology, South Korea</title>
		<link>http://www.himt.de/en/news/index.php/news/heidelberg-instruments-to-support-nano-and-biotechnology-research-division-at-the-daegu-gyeongbuk-institute-of-science-and-technology-south-korea</link>
		<comments>http://www.himt.de/en/news/index.php/news/heidelberg-instruments-to-support-nano-and-biotechnology-research-division-at-the-daegu-gyeongbuk-institute-of-science-and-technology-south-korea#comments</comments>
		<pubDate>Thu, 19 Jan 2012 04:00:50 +0000</pubDate>
		<dc:creator>himt</dc:creator>
		
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		<guid isPermaLink="false">http://www.himt.de/en/news/index.php/news/heidelberg-instruments-to-support-nano-and-biotechnology-research-division-at-the-daegu-gyeongbuk-institute-of-science-and-technology-south-korea</guid>
		<description><![CDATA[Heidelberg, Germany, January 19, 2012:  Heidelberg Instruments  announced the sale of an advanced DWL 4000 maskless laser lithography  system to the Division of Nano and Biotechnology Research at the Daegu  Gyeongbuk Institute of Science and Technology (DGIST), South Korea.
The DWL 4000 system will enable the user to expose minimum structures  on [...]]]></description>
			<content:encoded><![CDATA[<p><strong>Heidelberg, Germany, January 19, 2012: </strong> Heidelberg Instruments  announced the sale of an advanced DWL 4000 maskless laser lithography  system to the Division of Nano and Biotechnology Research at the Daegu  Gyeongbuk Institute of Science and Technology (DGIST), South Korea.</p>
<p>The DWL 4000 system will enable the user to expose minimum structures  on photoresist down to 0.6 microns, with an active write area of up to  400 mm by 400 mm.</p>
<p>“At DGIST, extensive research is conducted on a wide variety of  technology topics ranging from nanostructure-based fiber manufacturing  and biomedical diagnosis &amp; treatment to developing materials and  devices for energy industry, in order to shape the future of the  regional and national industries.  The DWL 4000 will play a crucial role  with its versatile capabilities such as grey scale exposure, ability to  expose thick resist and state of the art layer to layer alignment”.  states Alexander Forozan, Head of Global Sales and Business Development</p>
<p><strong>About Heidelberg Instruments, GmbH:</strong>  With an installation base  in over 40 countries, Heidelberg Instruments is a world leader in  production of high precision maskless lithography systems.  These  systems are used for direct writing and photomask production by some of  the most prestigious universities and industry leaders in the areas of  MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro  Optics, and many other related applications.</p>
<p><strong>Heidelberg Instruments, GmbH</strong></p>
<p>Contact: <a href="http://www.himt.de/en/contact/contact-form.php">info@himt.de</a></p>
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