Heidelberg, Germany, August 26, 2009: Heidelberg Instruments announced the sale of multiple µPG101 table top maskless patterning systems to several public and private institutions in Japan.
The µPG101 is an extremely economical and easy to use Micro Pattern Generator for direct write applications as well as low volume mask making. It is also perfectly suitable […]
Heidelberg, Germany, August 05, 2009: Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system and a µPG101 Table Top Lithography System to the 4D labs at the Simon Fraser University, Canada.
4D LABS is an advanced materials research center at Simon Fraser University (SFU) in British Columbia, Canada. The goal of […]
Heidelberg, Germany, April 02, 2009: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Ben Gurion University Nano Fabrication Center, Israel. The DWL200 system will enable the user to expose sub micron structures on photoresist , with an active write area of up to 200 mm by 200 […]
Heidelberg, Germany, March 26, 2009: Heidelberg Instruments announced the sale of an advanced DWL 2000 maskless laser lithography system, with an automatic photomask handling system, to the MESA+ Institute for Nanotechnology, at the University of Twente, The Netherlands.
The DWL 2000 system will enable the user to expose sub micron structures on photoresist, with […]
Heidelberg, Germany, March 24, 2009: Heidelberg Instruments, a leader in design, development and production of laser lithography systems, has announced plans of opening a Technical Application Center in Yokohama, Japan. The new center will house state of the art Heidelberg Instruments R&D equipments and process systems, will expand local technical sales […]
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