Heidelberg, Germany, June 26, 2008: Heidelberg Instruments announced the sale of a µPG101 table top maskless laser patterning system to the National University of Singapore, Engineering and Science Program.
The µPG 101 is an extremely economical and easy to use Micro Pattern Generator for direct write applications as well as low volume mask making. It […]
Heidelberg, Germany, May 28, 2008: Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced an order for a DWL 1100TFT Maskless Lithography System from Chungnam Display Center, Korea. DWL 1100TFT from Heidelberg instruments is ideal for production of today’s demanding photomasks used in advance display industry, with dimensions up […]
Heidelberg, Germany, May 27, 2008: Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to CRANN, the Center for Research on Adaptive Nanostructures Nanodevices at Trinity College Dublin.
The DWL 66FS maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to […]
Heidelberg, Germany, February 15, 2008: Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced the appointment of HTL Co. Japan Ltd., as an exclusive distributor of its large size lithography systems in Japan.
Heidelberg Instruments’ appointment of HTL Co. as an exclusive distributor of the large size photolithography systems was […]
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