Heidelberg, Germany, September 04, 2007: Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced an order for a VPG 800 Maskless Lithography System from Unimicron Corporation, Taiwan. VPG 800 is the latest innovation from Heidelberg instruments, ideal for high volume production of today’s demanding photomasks in advanced electronic packaging.
With seven […]
Heidelberg, Germany, August 20, 2007: Heidelberg Instruments announced the sale of an advanced DWL 200 maskless laser lithography system to the one of the largest Japanese based companies. System will be used in various research areas, including the MEMS based sensor technology.
The DWL 200 system will enable the user to expose sub micron structures on […]
Heidelberg, Germany, August 10, 2007: Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the Sandia National Laboratories, USA.
The DWL 66FS maskless lithography system will be capable of binary and grey scale exposure, layer to layer alignment, and will be able to produce minimum features down to 0.6 […]
Heidelberg, Germany, August 9, 2007: Heidelberg Instruments announced the sale of an advanced DWL 200 maskless laser lithography system to the National Nano Fab Center located at the Korea Advanced Institute of Science and Technology, Daejeon, Korea. Role of this facility is to assist national […]
Heidelberg, Germany, August 9, 2007: Heidelberg Instruments announced the sale of an advanced DWL 66 FS maskless laser lithography system to the Korea PhotonicsTechnology Institute (KOPTI). The Korea Photonics Technology Institute (KOPTI), established in Gwangju, is a research institution devoted exclusively to the development of advanced photonics technology.
The DWL 66 FS maskless lithography system will […]
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