Heidelberg Instruments Mikrotechnik GmbH

Heidelberg, Germany, June 16, 2006: Heidelberg Instruments announced the sale of an advanced DWL66 fs maskless laser lithography system to the Institut National de la Recherche Scientifique, Canada.
The DWL66 fs maskless lithography system is capable of binary and grey scale exposure, layer to layer alignment, and is able to produce minimum features down to 0.6 […]

Heidelberg, Germany, June 07, 2006: Heidelberg Instruments announced the sale of an advanced DWL66 fs maskless laser lithography system to the Institute of Material Research and Engineering(IMRE), a research institute of Singapores Agency for Science, Technology and Research(A*STAR). The system will be operated by the SERC Nanofabrication & Characterization Cluster (SNFC), which lends characterization support […]

Heidelberg, Germany, May 10, 2006: Heidelberg Instruments announced the sale of an advanced DWL400 maskless laser lithography system to the Institute of Optics, Information and Photonics (Max Planck Research Group) at the University of Erlangen-Nuremberg.
The DWL400 system will enable the user to expose minimum structures on photoresist down to 0.6 microns, with an active write […]

Heidelberg, Germany, January 10, 2006: Heidelberg Instruments announced the development of a table top maskless lithography system, the µPG101.
The µPG101 is an extremely economical and easy to use Micro Pattern Generator for direct write applications as well as low volume mask making. It is also perfectly suitable for rapid prototyping of 2D and 3D microstructures […]