Heidelberg, Germany, November 8, 2006: Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced the sale of an advance MW800fbm to a major company in Japan. This system will be used for production of high end display components.
MW800fbm is the latest generation of maskless lithography systems supplied by Heidelberg […]
Heidelberg, Germany, September 16, 2006: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Institute of Electron Technology Warsaw, Poland.
The DWL200 system will enable the user to expose minimum structures on photoresist down to 0.6 microns, with an active write area of up to 200 mm by 200 mm.
Heidelberg, Germany, Sept 13, 2006: Heidelberg Instruments announced the sale of an advanced DWL66 fs maskless laser lithography system to the Boston University Photonics Center.
The DWL66 fs maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce minimum features down to 0.6 microns.
Heidelberg, Germany, July 03, 2006: Heidelberg Instruments announced the sale of a µPG101 table top maskless laser patterning system, its latest product, to the Motorola Nanofabrication Research Laboratory at Florida International University, Miami, Florida.
The µPG101 is an extremely economical and easy to use Micro Pattern Generator for direct write applications as well as low volume […]
Heidelberg, Germany, June 21, 2006: Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced the installation of a MW800 system with grey scale exposure capability at a major Japanese based customer. This system will be used for production of advanced display and micro optic devices.
The MW800 laser lithography system, with […]
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