Heidelberg Instruments Mikrotechnik GmbH

Heidelberg, Germany, November 23, 2006: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Angstrom Microstructure Laboratory at the University of Uppsala, Sweden.
The DWL200 system will enable the user to expose sub micron structures on photoresist, with an active write area of up to 200 mm by 200 mm.

Heidelberg, Germany, November 22, 2006: Heidelberg Instruments announced the sale of a DWL66 maskless laser lithography system to the Concordia University Silicon Microsystems Fabrication Facility in Montreal, Canada.
The DWL66 maskless lithography system is capable of binary and grey scale exposure, layer to layer alignment, and is able to produce sub micron features.
System will be used […]

Heidelberg, Germany, November 21, 2006: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Nano Fabrication Center at the National Chiao Tung University, Taiwan.
The DWL200 system will enable the user to expose sub micron structures on photoresist , with an active write area of up to 200 mm by […]

Heidelberg, Germany, November 20, 2006: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Nano Fabrication Facility at the University of California, Santa Barbara.
The DWL200 system will enable the user to expose sub micron structures on photoresist , with an active write area of up to 200 mm by […]

Heidelberg, Germany, November 16, 2006: Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced the order for an advanced MW800fs system by Shenzhen New Way Electronic Co., LTD., Shenzhen, China.
Founded in 1997, Shenzhen New Way Electronic Co., LTD concentrates on production of advanced photomasks in the areas of LCD, […]