Heidelberg Instruments GmbH
Tel.: (+49) 6221 34 30 0
Fax: (+49) 6221 34 30 30
There are only few methods to create high qualitiy microstructures directly from an electronic design file, the most common ones being a Pattern Generator, an E-Beam, and the Maskless Laser Lithography technology. The allmost outdated Pattern Generators use a system of programable apertures and a flash light, making it suitable only for fairly simple microstructures. For complex designs with small structures, which are common today, the raster scan technology of the Laser Lithography Systems offers a much better quality and throughput. These systems use a focused laser beam to write arbitrary microstructures with minimum features sizes down to 500 nm on almost any material. They are today the most common system, when it commes to mask making or direct writing of microstructures for production and R&D. For structures smaller than 500 nm the most common methode is the E-Beam writing, offering a very high resolution and quality, but at the cost of a very slow write speed and a high cost of ownership.
To write high quality microstructures down to 500 nm in a short time, a Maskless Laser Lithography System is most likely the right choice. It eliminates the turnaround time needed for the mask making process and makes it quick and easy to adjust a prototype design.
To learn more about these systems, the possiblities and the technologies, please chose from the navigation on the left.