Merkmale und Ausstattung

  • Special Stage Systems
  • Unusual Dimensions
  • Custom Lasers

Spezielle Systeme - Lithographie-Systeme für spezifische Anforderungen

Spezielle Systeme

Systems developed for special requirements and unique applications

We are experts in the development of maskless lithography systems for new and special applications.
Talk to us, if you want to write microstructures on unusual substrates or if you need a unique feature to realize your application.To give you an idea of the possibilities, here are a few examples of special systems that we developed so far.

Freeform system for micro-optical components

To realize lithographic processing of non-planar substrates like lenses, we developed in cooperation with the Fraunhofer Institute for Applied Optics and Precision Engineering ( IOF) a maskless lithography system capable of writing on planar substrates as well as on concave and convex surfaces.

Freeform System Micro Optics
Freeform System Micro Optics
- Pictures Courtesy of IOF -

The System offers gray scale capabilities and can write structures down to 1 micrometer, making it possible to create complex and efficient micro-optical components and hybrids, combining refractive and diffractive elements. You can find numerous links and publications related to this system in our Download section or see it work in a short Movie [wmv / 3 MB].

Lithography systems for substrates with special dimensions

Our standard lithograhpy systems can accommodate substrates of arbitrary shapes with lateral dimentsions of up to 1600x1400 mm2. Larger substrates require specially designed systems, in which the substrate is stationary and the exposure unit is moved during the writing process. We have designed and installed these type of systems for linear encoders with dimensions of 3100x50 mm2 and for large area masks with 2400x1900 mm2 - the latter system is also equipped with a fully automatic handling system.

Large Area Mask Automatic Handling System
Large Area Mask Automatic Handling System

Deep UV lithography systems

The laser sources in our systems range from 355 nm to 532 nm, making it possible to expose all the standard photo resists. However, for special applications and resists even shorter wavelengths are required, That´s why we developed and installed deep UV lithography systems with a 244 nm laser source, which can expose these resists and write isolated structures down to 200 nm and lines and spaces with a period of 600 nm.

Kontaktieren us to discuss your Special System.