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Heidelberg, Germany, September 20, 2010: Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to National University of Singapore, Mechanobiology Institute. System will be used in fabrication of devices critical to quantitative systems approaches to understand biomechanical functions.
The DWL 66FS maskless lithography system will be capable of binary and grey scale exposure, layer to layer alignment, and will be able to produce minimum features down to 0.6 microns. In addition to exposure of standard positive resist, system will be capable of exposing SU8.
About Heidelberg Instruments, GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.
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