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Heidelberg Instruments to support Micro and Nano research at the Hoseo University, Korea

Heidelberg, Germany, November 12, 2007: Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the Hoseo University, Korea. System will be used for research in the areas of MEMS and Nanotechnology.

The DWL 66FS maskless lithography system is capable of binary and grey scale exposure, layer to layer alignment, and will be able to produce minimum features down to 0.6 microns.

About Heidelberg Instruments GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of Advanced Electronic Packaging, MEMS, BioMEMS, Nano Technology, ASICS, Display, Micro Optics, and many other related applications.

Heidelberg Instruments, GmbH
Britta Abler
Email: britta.abler@himt.de
Web: www.himt.de