Heidelberg Instruments Mikrotechnik GmbH

Heidelberg, Germany, August 10, 2007: Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the Sandia National Laboratories, USA.

The DWL 66FS maskless lithography system will be capable of binary and grey scale exposure, layer to layer alignment, and will be able to produce minimum features down to 0.6 microns.

“The Center for Integrated Nano-Technology Integration Lab at Sandia National Laboratories is a class 1000 clean room dedicated to the fabricating of Microsystems for CINT users. These customers are typically on site for limited times. Therefore, a means of quickly fabricating photolithography masks for the dynamic demands of the CINT users is needed. There will be a wide variety of users with diverse backgrounds. This will require the instrument to be flexible in setup and mask writing capabilities in a research and development environment. The system will need to be inherently safe and easy to operate. We require a minimum resolution of 1.0 micron and laser power of no less than 50mW which is needed for larger structure sizes and faster writing speed. Backside alignment is required to expose designs on the front side of the substrate with reference to alignment marks on the backside”.
States Dr. Christopher Slater.

About Heidelberg Instruments GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.

Heidelberg Instruments, GmbH
Britta Abler
Email: britta.abler@himt.de
Web: www.himt.de