Heidelberg, Germany, June 07, 2010: Heidelberg Instruments announced the sale of an advanced Lithography System to a European research unit of a large Asian based corporation.
The DWL maskless lithography system will be equipped with binary and gray scale exposure capabilities, layer to layer alignment, and sub micron exposure mode.
About Heidelberg Instruments GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.
Heidelberg Instruments, GmbH