Heidelberg Instruments announced the sale of a DWL66 maskless laser lithography system to the Concordia University Silicon Microsystems Fabrication Facility in Montreal, Canada
Heidelberg, Germany, November 22, 2006: Heidelberg Instruments announced the sale of a DWL66 maskless laser lithography system to the Concordia University Silicon Microsystems Fabrication Facility in Montreal, Canada.
The DWL66 maskless lithography system is capable of binary and grey scale exposure, layer to layer alignment, and is able to produce sub micron features.
System will be used in research focused on silicon-based MEMS . Silicon, a semi-conductor that is the basis of todays technologies, also has excellent optical properties as a conductor of infra-red light. MEMS devices are micrometers in size and have a wide variety of applications, from pressure sensors for vehicles to heat sensors for aerospace applications.
About Heidelberg Instruments, GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.
Heidelberg Instruments, GmbH
Alexander Forozan
VP, Sales and Marketing
Email: alexander.forozan@himt.de
Web: www.himt.de