Ben Gurion University Nano Fabrication Center to use Heidelberg Instruments’ maskless lithography system for nano research
Heidelberg, Germany, April 02, 2009: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Ben Gurion University Nano Fabrication Center, Israel. The DWL200 system will enable the user to expose sub micron structures on photoresist , with an active write area of up to 200 mm by 200 mm.
“BGU nanofabrication center (http://www.bgu.ac.il/nanofabrication) is one of the leading fabrication labs in Israel. It is part of the nanotechnology research center in Ben-Gurion University, having intensive cooperation with various research groups within the university and around the world and with different companies from the semiconductors, photonics and bio- and nano- related industry. The BGU Nanofabrication center is in operation since 2005 and its flagship expertise is quantum technologies. It gives complete services, from the design of a chip to a final product, and the DWL200 will complement the lithography capabilities now consisting of optical and e-beam write.” States Dr. Adi Goldner, Fabrication Facility Manager
About Heidelberg Instruments, GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.
Heidelberg Instruments, GmbH
Contact: Britta Abler
Web: www.himt.de