Heidelberg Instruments Microtechnik GmbH

Heidelberg Instruments introduces an advanced table top direct write lithography system

himt — Wed, 25 Jan 2012 14:00:50 +0000

Heidelberg, Germany, January 25, 2012: Heidelberg Instruments extends its leadership in manufacturing of direct write lithography systems with the launch of µPG 501 table top system. Designed with the focus on high performance at an affordable price, the
μPG 501 is the perfect solution for prototyping various devices such as MEMS, integrated Optics, microfluids, Lab-on-a-Chip, as well as mask production. The system has the ability to write structures down to1 μm at a speed of 50 mm²/min. This equals an exposure time of less than one hour for a 2“x 2“ pattern. With a footprint of only 60 x 75 cm² the μPG 501 comes with a wide range of capabilities.

System is equipped with the data conversion software which is simple to operate and provides basic design operations, and features a viewer for the design data as well as for the converted pixel data. The software supports multiple data formats such as GDSII, DXF, GERBER, CIF, BMP, and STL. μPG 501 is equipped with a high power LED light source, providing exceptional reliability and very long lifetime. The standard available wavelengths are 390 or 405 nm.
Other wavelengths may be available up on request. The μPG 501 can expose standard positive and negative photo resists as well as UV-resists such as SU8. Since the intensity dose is not limited, the system is suitable for applications which require thick resists. Utilizing sophisticated Gray Scale Exposure technology, the μPG 501 has the ability to create 3 dimensional structures such as blazed gratings or micro-lenses.

The light engine features the Digital Micromirror Device (DMD™) as the imaging device, a platform which is already available in the market and has been constantly improved
for usage in commercial as well as R&D applications. Besides enabling high throughput, a major advantage of the DMD™ is, it‘s reliability in the visible as well as in the UV spectrum of the illumination.

The integrated metrology system enables the μPG 501 to do overlay exposures either by manual or automatic alignment to multiple targets on the substrate. Company’s field proven Autofocus System compensates flatness variation of the substrate in real-time. This is an essential feature
especially for high-resolution lithography systems. Custom made vacuum chucks can hold substrates with various sizes up to 5”. The stage is driven by powerful linear motors and controlled by encoders at a resolution of 20 nm.

“The μPG 501 exemplifies Heidelberg Instruments continuing innovation aimed at extending advanced lithography technologies” said Alexander Forozan, head of Global Sales and Business Development at Heidelberg Instruments. “This system will present researchers with a fantastic tool at an affordable price, enabling them to conduct low volume lithography without using
photomasks and mask aligners.”

About Heidelberg Instruments, GmbH: With an installation base in over 40 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.

Heidelberg Instruments, GmbH

Contact: info@himt.de

Heidelberg Instruments to support micro and nano research at the University of Minnesota Nanofabrication Center (NFC)

himt — Fri, 20 Jan 2012 04:00:51 +0000

Heidelberg, Germany, January 20, 2012: Heidelberg Instruments announced the sale of a DWL 200 maskless laser lithography system to the University of Minnesota Nanofabrication Center in Minneapolis, USA.

The DWL 200 maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce sub micron features.

Heidelberg Instruments, GmbH

Contact: info@himt.de

Heidelberg Instruments to support Nano and Biotechnology Research Division at the Daegu Gyeongbuk Institute of Science and Technology, South Korea

himt — Thu, 19 Jan 2012 04:00:39 +0000

Heidelberg, Germany, January 19, 2012: Heidelberg Instruments announced the sale of an advanced DWL 4000 maskless laser lithography system to the Division of Nano and Biotechnology Research at the Daegu Gyeongbuk Institute of Science and Technology (DGIST), South Korea.

The DWL 4000 system will enable the user to expose minimum structures on photoresist down to 0.6 microns, with an active write area of up to 400 mm by 400 mm.

“At DGIST, extensive research is conducted on a wide variety of technology topics ranging from nanostructure-based fiber manufacturing and biomedical diagnosis & treatment to developing materials and devices for energy industry, in order to shape the future of the regional and national industries. The DWL 4000 will play a crucial role with its versatile capabilities such as grey scale exposure, ability to expose thick resist and state of the art layer to layer alignment”. states Alexander Forozan, Head of Global Sales and Business Development

Heidelberg Instruments, GmbH

Contact: info@himt.de

SPIE Photonics West

himt — Thu, 15 Dec 2011 12:46:10 +0000

21. - 26. Januar 2012

The Moscone Center
San Francisco, Kalifornien, USA

Besuchen Sie uns am Stand 5415

Website: Photonics West

MEMS 2012

himt — Thu, 01 Dec 2011 11:14:22 +0000

29. Januar - 2. Februar 2012

Marriott Paris Rive Gauche Hotel

Paris, Fankreich

Besuchen Sie uns auf dem Stand von innodys

Website: MEMS 2012