Heidelberg Instruments Microtechnik GmbH

Heidelberg Instruments GmbH receives multiple orders for advanced VPG maskless lithography systems from Asia

himt — Wed, 25 Apr 2012 06:41:28 +0000

Heidelberg, Germany, April 25, 2012: Heidelberg Instruments GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced order for two advanced VPG maskless lithography systems from an Asian based photomask production group. First system, a VPG 1400, is the latest and most advanced large area production system by Heidelberg Instruments. VPG 1400 has a write area of 1.4 by 1.4 meters, and is configured to expose sub-micron structures at a high throughput with an address grid of 10 nm.

The second system, a VPG 800, is capable of exposing an area of up to 800 mm by 800 mm.

“The VPG 1400 is another milestone in innovation by Heidelberg Instruments which with its wide range of capabilities will enable the end user to work on a number of applications. This order further solidifies the VPG technology as a leading solution for advanced photomask production groups.” states Alexander Forozan, Head of Global Sales and Business Development

About Heidelberg Instruments GmbH: With an installation base in over 40 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.

Heidelberg Instruments GmbH

Contact: info@himt.de

Heidelberg Instruments announces the installation of a DWL 2000 at Carl Zeiss Jena GmbH, Germany

himt — Wed, 22 Feb 2012 08:47:34 +0000

Heidelberg, Germany, February 22th, 2012: Heidelberg Instruments announces the installation of a DWL 2000 at Carl Zeiss Jena GmbH, Germany.

The DWL 2000 is a fast and flexible, high resolution pattern generator for mask making and direct writing of 2D and 3D micro structures. The system will be used for the production of state of the art micro optical components. With its advanced gray scale capabilities it can write arbitrary surface profiles and create highly complex optical elements with low surface roughness.

Carl Zeiss Jena GmbH is widely established company with facilities in Jena, Oberkochen and Minsk in Belarus - a flexible center of excellence for single components and for complex assemblies and modules. The internationally aligned sourcing and partner network provides support over the entire value-add process. With its innovational capability, Carl Zeiss Jena GmbH is synonymous with transforming technological challenges into benefit-oriented solutions. Committed employees, ultra-modern technologies and a highly productive engineering capability are at disposal.

About Heidelberg Instruments GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro optics, and many other related applications.

Heidelberg Instruments, GmbH

Contact: info@himt.de

Heidelberg Instruments introduces an advanced table top direct write lithography system

himt — Wed, 25 Jan 2012 14:00:50 +0000

Heidelberg, Germany, January 25, 2012: Heidelberg Instruments extends its leadership in manufacturing of direct write lithography systems with the launch of µPG 501 table top system. Designed with the focus on high performance at an affordable price, the
μPG 501 is the perfect solution for prototyping various devices such as MEMS, integrated Optics, microfluids, Lab-on-a-Chip, as well as mask production. The system has the ability to write structures down to1 μm at a speed of 50 mm²/min. This equals an exposure time of less than one hour for a 2“x 2“ pattern. With a footprint of only 60 x 75 cm² the μPG 501 comes with a wide range of capabilities.

System is equipped with the data conversion software which is simple to operate and provides basic design operations, and features a viewer for the design data as well as for the converted pixel data. The software supports multiple data formats such as GDSII, DXF, GERBER, CIF, BMP, and STL. μPG 501 is equipped with a high power LED light source, providing exceptional reliability and very long lifetime. The standard available wavelengths are 390 or 405 nm.
Other wavelengths may be available up on request. The μPG 501 can expose standard positive and negative photo resists as well as UV-resists such as SU8. Since the intensity dose is not limited, the system is suitable for applications which require thick resists. Utilizing sophisticated Gray Scale Exposure technology, the μPG 501 has the ability to create 3 dimensional structures such as blazed gratings or micro-lenses.

The light engine features the Digital Micromirror Device (DMD™) as the imaging device, a platform which is already available in the market and has been constantly improved
for usage in commercial as well as R&D applications. Besides enabling high throughput, a major advantage of the DMD™ is, it‘s reliability in the visible as well as in the UV spectrum of the illumination.

The integrated metrology system enables the μPG 501 to do overlay exposures either by manual or automatic alignment to multiple targets on the substrate. Company’s field proven Autofocus System compensates flatness variation of the substrate in real-time. This is an essential feature
especially for high-resolution lithography systems. Custom made vacuum chucks can hold substrates with various sizes up to 5”. The stage is driven by powerful linear motors and controlled by encoders at a resolution of 20 nm.

“The μPG 501 exemplifies Heidelberg Instruments continuing innovation aimed at extending advanced lithography technologies” said Alexander Forozan, head of Global Sales and Business Development at Heidelberg Instruments. “This system will present researchers with a fantastic tool at an affordable price, enabling them to conduct low volume lithography without using
photomasks and mask aligners.”

About Heidelberg Instruments, GmbH: With an installation base in over 40 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.

Heidelberg Instruments, GmbH

Contact: info@himt.de

Heidelberg Instruments to support micro and nano research at the University of Minnesota Nanofabrication Center (NFC)

himt — Fri, 20 Jan 2012 04:00:51 +0000

Heidelberg, Germany, January 20, 2012: Heidelberg Instruments announced the sale of a DWL 200 maskless laser lithography system to the University of Minnesota Nanofabrication Center in Minneapolis, USA.

The DWL 200 maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce sub micron features.

Heidelberg Instruments, GmbH

Contact: info@himt.de

Heidelberg Instruments to support Nano and Biotechnology Research Division at the Daegu Gyeongbuk Institute of Science and Technology, South Korea

himt — Thu, 19 Jan 2012 04:00:39 +0000

Heidelberg, Germany, January 19, 2012: Heidelberg Instruments announced the sale of an advanced DWL 4000 maskless laser lithography system to the Division of Nano and Biotechnology Research at the Daegu Gyeongbuk Institute of Science and Technology (DGIST), South Korea.

The DWL 4000 system will enable the user to expose minimum structures on photoresist down to 0.6 microns, with an active write area of up to 400 mm by 400 mm.

“At DGIST, extensive research is conducted on a wide variety of technology topics ranging from nanostructure-based fiber manufacturing and biomedical diagnosis & treatment to developing materials and devices for energy industry, in order to shape the future of the regional and national industries. The DWL 4000 will play a crucial role with its versatile capabilities such as grey scale exposure, ability to expose thick resist and state of the art layer to layer alignment”. states Alexander Forozan, Head of Global Sales and Business Development

Heidelberg Instruments, GmbH

Contact: info@himt.de