Heidelberg Instruments Mikrotechnik GmbH

Heidelberg, Germany, September 22, 2010:  Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced the order of an advanced DWL 4000 maskless lithography system by the China Electronic Technology Group Corporation located in Nanjing.
System will be used for fabrication of various MEMS devices.
About […]

Heidelberg, Germany, September 21, 2010:  Heidelberg Instruments announced the sale of an advanced Lithography System to the research unit of a large telecommunication service provider.
The DWL maskless lithography system will be equipped with binary and gray scale exposure capabilities, layer to layer alignment.  System will be used for fabricating of […]

Heidelberg, Germany, September 20, 2010:  Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to National University of Singapore, Mechanobiology Institute.  System will be used in fabrication of devices critical to quantitative systems approaches to understand biomechanical functions.
The DWL 66FS maskless lithography system […]

Heidelberg, Germany, June 07, 2010:  Heidelberg Instruments announced the sale of an advanced Lithography System to a European research unit of a large Asian based corporation.
The DWL maskless lithography system will be equipped with binary and gray scale exposure capabilities, layer to layer alignment, and sub micron exposure mode.
About Heidelberg Instruments […]

Heidelberg, Germany, June 01, 2010:  Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced order for an advanced VPG maskless lithography system from a leading Asian based photomask production group.
“VPG platform continues to be on high demand for large photomask production.  We are very […]