Heidelberg Instruments Mikrotechnik GmbH

Heidelberg, Germany, March 20, 2009: Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced the installation and qualification of DWL 1100TFT Maskless Lithography System at the Chungnam Display Center, Korea. DWL 1100TFT from Heidelberg instruments is ideal for production of today’s demanding photomasks used in advance display industry, […]

Heidelberg, Germany, March 09, 2009: Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the University of Louisville Center for Micro/Nano Technology.
The University of Louisville Center for Micro/Nano Technology specializes in providing fabrication and design services for numerous MEMS, microelectronic, electro-optic and nanotechnology applications. Services begin at the […]

Heidelberg, Germany, March 03, 2009: Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the Lanzhou University, located in Lanzhou, China. System will be used for fabrication of photomasks.
The DWL 66FS maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and […]