Heidelberg Instruments Mikrotechnik GmbH

Heidelberg, Germany, December 18, 2009:  Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced order for two advanced VPG maskless lithography systems from an Asian based photomask production group.
These systems will have a write area of up to 800 mm by 800 mm and will […]

Heidelberg, Germany, December 17, 2009: Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the Regensburg University of Applied Sciences, Regensburg, Germany.
The DWL 66FS maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce sub […]

Heidelberg, Germany, December 07, 2009: Heidelberg Instruments announced the sale of two advanced DWL 2000 maskless laser lithography systems to Asian based customers.
The DWL 2000 system is a fast and flexible, high resolution pattern generator for mask making and direct writing and will enable the user to expose sub micron structures on photoresist, with […]

Heidelberg, Germany, December 4, 2009: Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced the repeat order for an advanced maskless lithography system by Toyo Precision Parts MFG. Co., Ltd, Japan. This system will be used for production of photomasks used in discrete semiconductors, encoder disks, MEMS, […]

Heidelberg, Germany, November 26, 2009: Heidelberg Instruments announced the sale of an advanced DWL 2000 maskless laser lithography system to the Cornell NanoScale Science and Technology Facility, located in Ithaca, New York.
The DWL 2000 system will enable the user to expose sub micron structures on photoresist, with an active write area of up to […]