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Heidelberg, Germany, May 23, 2007: Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced introduction of the new Volume Pattern Generator (VPG) line of large area lithography […]
Heidelberg, Germany, April 25, 2007: Heidelberg Instruments announced the sale of an advanced DWL 200 maskless laser lithography system to the POSTECH National Center for Nanomaterials and Technology, South Korea. The DWL 200 will be used in production of photomasks plus MEMS and Nanotechnology research.
The DWL 200 system will enable the user to expose sub […]
Heidelberg, Germany, April 16, 2007: Heidelberg Instruments announced the sale of an advanced DWL 66 FS maskless laser lithography system to the Yale University, Department of Electrical Engineering.
The DWL 66 FS maskless lithography system is capable of binary and 3-D exposure, layer to layer alignment, and is able to produce minimum features down to 0.6 […]
Heidelberg, Germany, April 11, 2007: Heidelberg Instruments announced the sale of an advanced DWL 66 FS maskless laser lithography system to the Pierre and Marie Curie University, Institut des NanoSciences de Paris(INSP).
The DWL 66 FS maskless lithography system is capable of binary and 3-D exposure, layer to layer alignment, and is able to produce minimum […]
Heidelberg, Germany, January 19, 2007: Heidelberg Instruments announced the sale of a DWL 66 FS maskless laser lithography system to the Rose Fotomasken, Bergisch Gladbach, Germany.
The DWL 66 FS maskless lithography system is capable of binary and grey scale exposure, layer to layer alignment, and is able to produce sub micron features. Rose Fotomasken will […]
