Heidelberg Instruments Mikrotechnik GmbH

Heidelberg, Germany, December 21, 2007: Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced an order for a DWL 1100 Maskless Lithography System from Mikcell Oy, Finland.
DWL 1100 maskless lithography system is capable of exposing photomasks of up to 1.1m x 1.1m, with features down to 1 micron. […]

Heidelberg, Germany, December 18, 2007: Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the United States based National Institute of Standards and Technology (NIST).
The DWL system will be installed in the clean room at the Center for Nanoscale Science and Technology, which is part of NIST (www.cnst.nist.gov). […]

Heidelberg, Germany, November 29, 2007: Heidelberg Instruments, a leader in design, development and production of laser lithography systems, launched its new website at www.himt.de on Monday, November 27.
The new site contains extensive information on Heidelberg Instruments product line, including the new DWL 4000, DWL 8000, and VPG family of Maskless Lithography Systems. It […]

Heidelberg, Germany, November 12, 2007: Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the Hoseo University, Korea. System will be used for research in the areas of MEMS and Nanotechnology.
The DWL 66FS maskless lithography system is capable of binary and grey scale exposure, layer to layer alignment, and […]

Heidelberg, Germany, November 02, 2007: Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the Technology Research Institute of Osaka.
The Institute is a public research organization founded to conduct technical guidance and research collaborations with industries in Osaka, especially small-to-medium-sized enterprises.
DWL 66FS will be used for various research in […]