Heidelberg Instruments Mikrotechnik GmbH

Heidelberg, Germany, December 21, 2006: Heidelberg Instruments announced the sale of an advanced DWL400 maskless laser lithography system to the BioIT National Foundry Center at the Seoul National University.
The DWL400 system will enable the user to expose sub micron structures on photoresist both in grey scale and binary mode, with an active write area of […]

Heidelberg, Germany, December 20, 2006: Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Middle East Technical University, Turkey. The DWL200 system will enable the user to expose minimum structures on photoresist down to 0.6 microns, with an active write area of up to 200 mm by 200mm.
“METU-MEMS facilities […]

Heidelberg, Germany, December 12, 2006: Heidelberg Instruments announced the sale of an advanced DWL66 fs maskless laser lithography system to the National Institute for Research and Development in Microtechnologies, Romania.
The DWL66 fs maskless lithography system is capable of binary and grey scale exposure, layer to layer alignment, and is able to produce minimum features down […]

Heidelberg, Germany, December 01, 2006: Heidelberg Instruments announced the sale of a DWL66 maskless laser lithography system to the Universidad Nacional Aut

Heidelberg, Germany, November 28, 2006: Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced the sale of an advance MW800fbm to a major Asian based photomask supplier. This system will be used for production of high end, large area, photomasks.
MW800fbm is the latest generation of maskless lithography systems supplied […]