Heidelberg, Germany, April 25, 2012: Heidelberg Instruments GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced order for two advanced VPG maskless lithography systems from an Asian based photomask production group. First system, a VPG 1400, is the latest and most advanced large area production system by Heidelberg Instruments. VPG 1400 […]
Heidelberg, Germany, February 22th, 2012: Heidelberg Instruments announces the installation of a DWL 2000 at Carl Zeiss Jena GmbH, Germany.
The DWL 2000 is a fast and flexible, high resolution pattern generator for mask making and direct writing of 2D and 3D micro structures. The system will be used for the production of state of the […]
Heidelberg, Germany, January 25, 2012: Heidelberg Instruments extends its leadership in manufacturing of direct write lithography systems with the launch of µPG 501 table top system. Designed with the focus on high performance at an affordable price, the
μPG 501 is the perfect solution for prototyping various devices such as MEMS, integrated […]
Heidelberg, Germany, January 20, 2012: Heidelberg Instruments announced the sale of a DWL 200 maskless laser lithography system to the University of Minnesota Nanofabrication Center in Minneapolis, USA.
The DWL 200 maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce sub micron features.
About Heidelberg Instruments, […]
Heidelberg, Germany, January 19, 2012: Heidelberg Instruments announced the sale of an advanced DWL 4000 maskless laser lithography system to the Division of Nano and Biotechnology Research at the Daegu Gyeongbuk Institute of Science and Technology (DGIST), South Korea.
The DWL 4000 system will enable the user to expose minimum structures on photoresist down to 0.6 […]