Heidelberg Instruments Mikrotechnik GmbH

Heidelberg, Germany, June 07, 2010:  Heidelberg Instruments announced the sale of an advanced Lithography System to a European research unit of a large Asian based corporation.
The DWL maskless lithography system will be equipped with binary and gray scale exposure capabilities, layer to layer alignment, and sub micron exposure mode.
About Heidelberg Instruments […]

Heidelberg, Germany, June 01, 2010:  Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced order for an advanced VPG maskless lithography system from a leading Asian based photomask production group.
“VPG platform continues to be on high demand for large photomask production.  We are very […]

Heidelberg, Germany, May 27, 2010:  Heidelberg Instruments announced the sale of multiple µPG101 Table Top Lithography Systems to the Air Force Institute of Technology, USA.
The µPG101 is an extremely economical and easy to use Micro Pattern Generator for direct write applications as well as low volume mask making. It is also […]

Heidelberg, Germany, May 24, 2010:  Heidelberg Instruments announced the delivery of an advanced maskless lithography system customized for micro pattering of free form and non planer substrates such as concave and convex lenses.
The new lithography system will contribute to the Hemispherical Array Detectors for Imaging (HARDI) program, by the Defense Advanced […]

Heidelberg, Germany, February 11, 2010:  Heidelberg Instruments announced the sale of a µPG101 Table Top Lithography System to the Columbia University, Center for Integrated Science and Engineering, New York City.
The µPG101 is an extremely economical and easy to use Micro Pattern Generator for direct write applications as well as […]