Heidelberg Instruments Mikrotechnik GmbH

Heidelberg, Germany, January 25, 2012:  Heidelberg Instruments extends its leadership in manufacturing of direct write lithography systems with the launch of µPG 501 table top system.  Designed with the focus on high performance at an affordable price, the
μPG 501 is the perfect solution for prototyping various devices such as MEMS, integrated […]

Heidelberg, Germany, January 20, 2012:  Heidelberg Instruments announced the sale of a DWL 200 maskless laser lithography system to the University of Minnesota Nanofabrication Center in Minneapolis, USA.
The DWL 200 maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce sub micron features.
About Heidelberg Instruments, […]

Heidelberg, Germany, January 19, 2012:  Heidelberg Instruments announced the sale of an advanced DWL 4000 maskless laser lithography system to the Division of Nano and Biotechnology Research at the Daegu Gyeongbuk Institute of Science and Technology (DGIST), South Korea.
The DWL 4000 system will enable the user to expose minimum structures on photoresist down to 0.6 […]

Heidelberg, Germany, September 09, 2011:  Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced an order for a VPG 800 Maskless Lithography System from the Taiwan based Kinsus Interconnect Technology Corp .  VPG 800 is an ideal for high volume production of today’s demanding photomasks […]

Circuitry-shrinking technique enables tinier computer chips, solar cells and other nanoscale devices.
BOULDER, Colo., June 22, 2011 – Heidelberg Instruments GmbH (Heidelberg, Germany) and the University of Colorado recently completed an exclusive option agreement for a CU technique that shrinks the circuitry of nano-devices, enabling the creation of smaller computer […]